- All sections
- H - Electricity
- H01L - Semiconductor devices not covered by class
- H01L 21/228 - Diffusion of impurity materials, e.g. doping materials, electrode materials, into, or out of, a semiconductor body, or between semiconductor regions; Redistribution of impurity materials, e.g. without introduction or removal of further dopant using diffusion into, or out of, a solid from or into a liquid phase, e.g. alloy diffusion processes
Patent holdings for IPC class H01L 21/228
Total number of patents in this class: 69
10-year publication summary
14
|
10
|
7
|
6
|
4
|
3
|
2
|
1
|
3
|
1
|
2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
Tokyo Ohka Kogyo Co., Ltd. | 1481 |
5 |
Fuji Electric Co., Ltd. | 4750 |
4 |
Evonik Degussa GmbH | 1574 |
3 |
Screen Holdings Co., Ltd. | 2431 |
3 |
International Business Machines Corporation | 60644 |
2 |
Tokyo Electron Limited | 11599 |
2 |
The Regents of the University of Michigan | 4409 |
2 |
ASM Japan K.K. | 98 |
2 |
Dynaloy, LLC | 14 |
2 |
Gigaphoton Inc. | 1120 |
2 |
Kyushu University, National University Corporation | 1572 |
2 |
Toyo Aluminium Kabushiki Kaisha | 357 |
2 |
Kokusai Electric Corporation | 1791 |
2 |
Maxeon Solar Pte. Ltd. | 659 |
2 |
Xerox Corporation | 7503 |
1 |
E. I. du Pont de Nemours and Company | 4345 |
1 |
Honeywell International Inc. | 13799 |
1 |
Intel Corporation | 45621 |
1 |
Varian Semiconductor Equipment Associates, Inc. | 1282 |
1 |
Mitsubishi Electric Corporation | 43934 |
1 |
Other owners | 28 |