• All sections
  • H - Electricity
  • H01L - Semiconductor devices not covered by class
  • H01L 21/228 - Diffusion of impurity materials, e.g. doping materials, electrode materials, into, or out of, a semiconductor body, or between semiconductor regions; Redistribution of impurity materials, e.g. without introduction or removal of further dopant using diffusion into, or out of, a solid from or into a liquid phase, e.g. alloy diffusion processes

Patent holdings for IPC class H01L 21/228

Total number of patents in this class: 69

10-year publication summary

14
10
7
6
4
3
2
1
3
1
2015 2016 2017 2018 2019 2020 2021 2022 2023 2024

Principal owners for this class

Owner
All patents
This class
Tokyo Ohka Kogyo Co., Ltd.
1481
5
Fuji Electric Co., Ltd.
4750
4
Evonik Degussa GmbH
1574
3
Screen Holdings Co., Ltd.
2431
3
International Business Machines Corporation
60644
2
Tokyo Electron Limited
11599
2
The Regents of the University of Michigan
4409
2
ASM Japan K.K.
98
2
Dynaloy, LLC
14
2
Gigaphoton Inc.
1120
2
Kyushu University, National University Corporation
1572
2
Toyo Aluminium Kabushiki Kaisha
357
2
Kokusai Electric Corporation
1791
2
Maxeon Solar Pte. Ltd.
659
2
Xerox Corporation
7503
1
E. I. du Pont de Nemours and Company
4345
1
Honeywell International Inc.
13799
1
Intel Corporation
45621
1
Varian Semiconductor Equipment Associates, Inc.
1282
1
Mitsubishi Electric Corporation
43934
1
Other owners 28